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HDPCVD in Patent Meaning

The HDPCVD meaning in Patent terms is "High Density Plasma Chemical Vapor Deposition". There are 1 related meanings of the HDPCVD Patent abbreviation.

HDPCVD on Patent Full Forms

  1. High Density Plasma Chemical Vapor Deposition

Frequently Asked Questions (FAQ)

  1. What does HDPCVD stand for Patent?

    HDPCVD stands for High Density Plasma Chemical Vapor Deposition in Patent terms.

  2. What is the shortened form of High Density Plasma Chemical Vapor Deposition in Patent?

    The short form of "High Density Plasma Chemical Vapor Deposition" is HDPCVD for Patent.

Citation

HDPCVD in Patent. Acronym24.com. (2019, December 24). Retrieved March 12, 2025 from https://acronym24.com/hdpcvd-meaning-in-patent/

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