HTCVD in Substrate Meaning
The HTCVD meaning in Substrate terms is "High Temperature Chemical Vapor Deposition". There are 1 related meanings of the HTCVD Substrate abbreviation.
HTCVD on Substrate Full Forms
- High Temperature Chemical Vapor Deposition
Frequently Asked Questions (FAQ)
What does HTCVD stand for Substrate?
HTCVD stands for High Temperature Chemical Vapor Deposition in Substrate terms.
What is the shortened form of High Temperature Chemical Vapor Deposition in Substrate?
The short form of "High Temperature Chemical Vapor Deposition" is HTCVD for Substrate.
Citation
HTCVD in Substrate. Acronym24.com. (2020, May 24). Retrieved February 2, 2025 from https://acronym24.com/htcvd-meaning-in-substrate/
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