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LEPECVD in Patent Meaning

The LEPECVD meaning in Patent terms is "Low Energy Plasma Enhanced Chemical Vapor Deposition". There are 1 related meanings of the LEPECVD Patent abbreviation.

LEPECVD on Patent Full Forms

  1. Low Energy Plasma Enhanced Chemical Vapor Deposition

Frequently Asked Questions (FAQ)

  1. What does LEPECVD stand for Patent?

    LEPECVD stands for Low Energy Plasma Enhanced Chemical Vapor Deposition in Patent terms.

  2. What is the shortened form of Low Energy Plasma Enhanced Chemical Vapor Deposition in Patent?

    The short form of "Low Energy Plasma Enhanced Chemical Vapor Deposition" is LEPECVD for Patent.

Citation

LEPECVD in Patent. Acronym24.com. (2020, May 24). Retrieved December 25, 2024 from https://acronym24.com/lepecvd-meaning-in-patent/

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