PACVD in Technology Meaning

The PACVD meaning in Technology terms is "Plasma-Activated Chemical Vapor Deposition". There are 5 related meanings of the PACVD Technology abbreviation.

PACVD on Technology Full Forms

  1. Plasma-Activated Chemical Vapor Deposition
  2. Plasma-Assisted Chemical Vapor Deposition A chemical vapor deposition process that uses low-pressure glow-discharge plasmas to promote the chemical deposition reactions. Also called plasma-enhanced chemical vapor deposition.
  3. Plasma Assisted Chemical Vapor Deposition
  4. Plasma Assisted Chemical Vapour Deposition
  5. Plasma-Assisted Chemical Vapour Deposition

Frequently Asked Questions (FAQ)

  1. What does PACVD stand for Technology?

    PACVD stands for Plasma-Activated Chemical Vapor Deposition in Technology terms.

  2. What is the shortened form of Plasma Assisted Chemical Vapour Deposition in Technology?

    The short form of "Plasma Assisted Chemical Vapour Deposition" is PACVD for Technology.

Citation

PACVD in Technology. Acronym24.com. (2020, July 16). Retrieved November 27, 2024 from https://acronym24.com/pacvd-meaning-in-technology/

Last updated