PACVD in Technology Meaning
The PACVD meaning in Technology terms is "Plasma-Activated Chemical Vapor Deposition". There are 5 related meanings of the PACVD Technology abbreviation.
PACVD on Technology Full Forms
- Plasma-Activated Chemical Vapor Deposition
- Plasma-Assisted Chemical Vapor Deposition A chemical vapor deposition process that uses low-pressure glow-discharge plasmas to promote the chemical deposition reactions. Also called plasma-enhanced chemical vapor deposition.
- Plasma Assisted Chemical Vapor Deposition
- Plasma Assisted Chemical Vapour Deposition
- Plasma-Assisted Chemical Vapour Deposition
Frequently Asked Questions (FAQ)
What does PACVD stand for Technology?
PACVD stands for Plasma-Assisted Chemical Vapour Deposition in Technology terms.
What is the shortened form of Plasma-Activated Chemical Vapor Deposition in Technology?
The short form of "Plasma-Activated Chemical Vapor Deposition" is PACVD for Technology.
Citation
PACVD in Technology. Acronym24.com. (2020, July 16). Retrieved March 15, 2025 from https://acronym24.com/pacvd-meaning-in-technology/
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