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PACVD in Technology Meaning

The PACVD meaning in Technology terms is "Plasma-Activated Chemical Vapor Deposition". There are 5 related meanings of the PACVD Technology abbreviation.

PACVD on Technology Full Forms

  1. Plasma-Activated Chemical Vapor Deposition
  2. Plasma-Assisted Chemical Vapor Deposition A chemical vapor deposition process that uses low-pressure glow-discharge plasmas to promote the chemical deposition reactions. Also called plasma-enhanced chemical vapor deposition.
  3. Plasma Assisted Chemical Vapor Deposition
  4. Plasma Assisted Chemical Vapour Deposition
  5. Plasma-Assisted Chemical Vapour Deposition

Frequently Asked Questions (FAQ)

  1. What does PACVD stand for Technology?

    PACVD stands for Plasma-Assisted Chemical Vapour Deposition in Technology terms.

  2. What is the shortened form of Plasma-Activated Chemical Vapor Deposition in Technology?

    The short form of "Plasma-Activated Chemical Vapor Deposition" is PACVD for Technology.

Citation

PACVD in Technology. Acronym24.com. (2020, July 16). Retrieved March 15, 2025 from https://acronym24.com/pacvd-meaning-in-technology/

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