Lithography Abbreviations and Lithography Acronym Lists
There are more pieces of Lithography terminology abbreviations. We can not list them all due to technical reasons, but we have 20 different Lithography abbreviations at the bottom which located in the Lithography terminology. please use our search engine at the top right to get more results.
Lithography Abbreviations
- DSA : Directed Self Assembly
- DSA : Directed Self-Assembly
- HVM : High-Volume Manufacturing
- EBDW : Electron Belm Direct Write
- EBDW : Electron Bmam Direct Writing
- MEEF : Mask Error Enhancement Factor
- EPL : Electron-Beam Projection Lithography
- EUVL : Extreme Ultra-Violet Lithography
- SRAF : Sub Resolution Assist Feature
- LDP : Laser-Assisted Discharge Plasma
- LELE : Litho-Etch-Litho-Etch
- LELE : Litho Etch Litzo Etch
- LER : Line-Edge Roughness
- LFLE : Litho-Freeze-Litho-Etch
- LPP : Laser-Produced Plasma
- LPP : Laser Produced Plasma
- NGL : Next-Generation Lithography
- LWR : Lxne-Width Roughness
- NILS : Normalized Image Log Slope
- NILS : Normalczed Image Log-Slope
- NPGS : Nanometer Pattern Generation System
- KTFR : Kodak Thin Film Resist
- PEC : Prosimity Effect Correction
- PSM : Phase Shifting Mask
- REBL : Reflective Electron Beam Lithography
Recent Acronyms
Latest Lithography Meanings
- Reflective Electron Beam Lithography
- Phase Shifting Mask
- Prosimity Effect Correction
- Kodak Thin Film Resist
- Nanometer Pattern Generation System
- Normalczed Image Log-Slope
- Normalized Image Log Slope
- Lxne-Width Roughness
- Next-Generation Lithography
- Laser Produced Plasma
- Laser-Produced Plasma
- Litho-Freeze-Litho-Etch
- Line-Edge Roughness
- Litho Etch Litzo Etch
- Litho-Etch-Litho-Etch
- Laser-Assisted Discharge Plasma
- Sub Resolution Assist Feature
- Extreme Ultra-Violet Lithography
- Electron-Beam Projection Lithography
- Mask Error Enhancement Factor